EDI System Skid
In EDI System, different kinds of ions will be absorbed by ion exchange resin, the absorbed ions will migrate to concentrated water through the resin layer and selective membrane under the action of voltage. Water molecule will be decomposed into hydrogen ions and hydrogen oxide ions under the action of voltage, and replace the anion and cation in ion exchange resin, which can help to regenerate resin continuously. By that, the EDI System can continuously produce highly purified water.
Compared with the traditional treatment method, this unique deionization process has plenty advantages: easy to operate, stable water quality, continuous production, small area required, no need for chemical regeneration, no harmful substance discharged. Therefore, EDI System can reduce manpower, operation and maintenance cost, and improves management.
① Lower conductivity
② Lower SiO2 concentration
③ Lower TOC concentration
④ Lower Boron concentration
- Process water of food and beverage industry
- Process water of biological and pharmaceutical industry
- Ultra-pure water generation in fine chemical and electronic industry
- Lab water generation
- Highly purified chemical generation
System Elements:
- Safety filter, Online resistivity detection, Imported EDI module and key valve of related pipes.
Options:
- Feed pump, UV sterilizer
Inlet Water Requirements:
| Parameters： | Inlet water requirement： | Unit： |
| Hardness | < 1.0 | ppm（mg/L） |
| Total anion that can be exchanged (by CaCO3) | < 25 | ppm（mg/L） |
| Conductivity | < 43 | μs/cm |
| Silicon（active silicon） | < 1.0@minimum-standard water production | ppm（mg/L） |
| < 0.77@maximum water production | ppm（mg/L） | |
| TOC | < 0.5 | ppm（mg/L） |
| Total Chlorine | < 0.05 | ppm（mg/L） |
| Iron, Manganese, hydrogen sulfide | < 0.01 | ppm（mg/L） |
| Residual Chlorine | < 0.05 | ppm（mg/L） |
| Temperature | 4.4-38 | ℃ |
| Turbidity | < 1.0 | NTU |
| Color | < 5 | APHA |
| pH | 4-11 | 4-11 |
Outlet water quality:
| Conductivity (MOhm˙cm) | >16 |
| pH | 6.5-8 |
| SiO2 removal rate | Up to 99% or < 5ppb |
| Boron removal rate | >95% |
| Capability | Raw Water Source | Size |
| 500L/h-1T/h | Second pass RO | L1.35*W1.60*H1.80 |
| 2T/h-4T/h | Second pass RO | L1.35*W1.60*H1.80 |
| 5T/h | Second pass RO | L1.35*W1.60*H1.80 |
| 10T/h | Second pass RO | L1.85*W1.60*H1.80 |
| 15T/h | Second pass RO | L2.30*W1.60*H1.80 |
| 20T/h | Second pass RO | L2.80*W1.60*H1.80 |
